Structural, Mechanical, and Tribological Properties of Molybdenum-Doped Diamond-like Carbon Films
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2025-05-15 |
| Journal | Crystals |
| Authors | Hassan Zhairabany, Hesam Khaksar, Edgars Vanags, KriĹĄjÄnis Ĺ mits, Anatolijs Ĺ arakovskis |
| Institutions | Jagiellonian University, University of Latvia |
| Citations | 1 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive SummaryâThis research investigates the synthesis and performance tuning of Molybdenum-doped Diamond-like Carbon (Mo-DLC) films via DC magnetron sputtering, focusing on the critical influence of Mo concentration and deposition temperature on nanoscale properties.
- Optimal Friction Performance: The lowest friction coefficient (CoF) of 0.029 was achieved in the Mo-DLC1 film (1.2 at.% Mo) deposited at the highest temperature (235 °C). This low friction is crucial for nano-device functionality.
- Temperature-Hardness Trade-off: Reducing the synthesis temperature from 235 °C to 180 °C significantly enhanced the nanohardness (up to 8.24 GPa) and sp3 bond fraction, but resulted in a severe degradation of tribological performance, increasing the CoF up to seven times (to 0.21).
- Graphitization Mechanism: Increasing Mo concentration (up to 10.3 at.%) promotes the graphitization of the DLC matrix, lowering the sp3 site fraction and reducing nanohardness by up to 21% (down to 6.32 GPa).
- Oxygen Incorporation: High oxygen content (up to 20.4 at.% at 180 °C) was observed, particularly at lower deposition temperatures and higher Mo concentrations, contributing to reduced hardness and elasticity.
- Tailoring Properties: The study confirms that controlling Mo content and substrate temperature provides a viable pathway for tailoring the sp3/sp2 ratio, nanohardness, and nano-friction coefficient for specific micro- and nano-device applications.
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Deposition Method | DC Magnetron Sputtering | N/A | Synthesis technique |
| Substrate Material | Si (100) wafers | N/A | Film base |
| Working Pressure | ~3 | Pa | Argon atmosphere |
| Target Current (Graphite) | 1.5 | A | Fixed parameter |
| Target Current (Mo) | 0.25 | A | Fixed parameter |
| Deposition Temperature Range | 180 to 235 | °C | Controlled by target-substrate distance (4 cm to 8 cm) |
| Film Thickness Range | 150 to 210 | nm | Measured via SEM cross-section |
| Mo Concentration Range | 1.2 to 10.3 | at.% | Measured via EDX |
| Oxygen Concentration Range | 6.5 to 20.4 | at.% | Measured via EDX (Highest in Mo-DLC5 at 180 °C) |
| Nanohardness Range (H) | 6.32 to 8.24 | GPa | Measured via Nanoindenter |
| Youngâs Modulus Range (E) | 49.22 to 83.66 | GPa | Measured via Nanoindenter |
| Lowest Friction Coefficient (CoF) | 0.029 | N/A | Mo-DLC1 (1.2 at.% Mo, 235 °C) |
| Highest Friction Coefficient (CoF) | 0.21 | N/A | Mo-DLC5 (6.6 at.% Mo, 180 °C) |
| Lowest RMS Roughness (RRMS) | 1.9 | nm | Mo-DLC1 |
| G Peak Position Range | 1566.1 to 1576.8 | cm-1 | Raman Spectroscopy data |
| sp3 C-C Content (XPS) | 29 to 35 | % | Measured after 75 s etching time |
Key Methodologies
Section titled âKey MethodologiesâThe Mo-DLC films were synthesized using DC magnetron sputtering, with properties controlled primarily by target-substrate distance and Mo flux.
- Substrate and Chamber Setup: Si (100) wafers were used as substrates. The chamber was evacuated to a base pressure of ~0.01 Pa, then filled with Argon to a working pressure of ~3 Pa.
- Target Configuration: Two 3-inch targets (Graphite, 99.95% purity Molybdenum) were used. Target currents were fixed (1.5 A for C, 0.25 A for Mo).
- Mo Concentration Control: A shield with a slit mount was used above the Mo target. Mo concentration (1.2 at.% to 10.3 at.%) was controlled by varying the slit opening width (4 mm to 16 mm).
- Temperature Control: Substrate temperature (180 °C to 235 °C) was controlled by varying the target-substrate distance (4 cm, 6 cm, 8 cm). Deposition duration was fixed at 10 minutes for all films.
- Microstructural Analysis:
- Composition: Energy Dispersive X-ray Spectroscopy (EDX) determined elemental composition and mapping.
- Bonding: X-ray Photoelectron Spectroscopy (XPS) and Raman spectroscopy determined sp3/sp2 ratios and Mo-C/Mo-O bonding states.
- Mechanical and Tribological Testing:
- Hardness/Modulus: Nanoindentation (MTS Agilent G200) using Continuous Stiffness Measurement (CSM) determined nanohardness (H) and Youngâs modulus (E).
- Friction/Roughness: Atomic Force Microscopy (AFM) measured surface roughness (Ra, RRMS) and nano-friction force (used to calculate CoF) under loads ranging from 10 nN to 45 nN.
Commercial Applications
Section titled âCommercial ApplicationsâThe ability to precisely tune the hardness and friction coefficient of Mo-DLC films makes them highly valuable for advanced engineering sectors, particularly those involving micro-scale moving parts.
- Micro-Electro-Mechanical Systems (MEMS): Essential for reducing friction and wear in critical components like micro-gearboxes, micro-turbines, and micro-actuators, where surface forces dominate bulk properties.
- Precision Machining and Tooling: Used as protective coatings for cutting tools, molds, and dies, leveraging high hardness (up to 8.4 GPa) and wear resistance.
- Automotive and Aerospace: Application in high-performance engine components, fuel injection systems, and satellite mechanisms requiring stable, low-friction coatings across operational temperature ranges.
- Biomedical Devices: Mo-DLC films offer enhanced biocompatibility and mechanical stability for use in orthopedic implants and cardiovascular stents, where low wear rates are mandatory.
- Data Storage Devices: Potential use in hard disk drives (HDD) and magnetic storage media to protect read/write heads and platters due to their low friction and high density.
View Original Abstract
Non-hydrogenated diamond-like carbon (DLC) films and molybdenum-doped diamond-like carbon (Mo-DLC) films were deposited by direct current magnetron sputtering. The formation was carried out on Si (100) wafers. The influence of molybdenum concentration and deposition temperature on the surface morphology, chemical composition, type of chemical bonds, friction force at nanoscale, and nanohardness of the DLC coatings were investigated by atomic force microscopy (AFM), energy dispersive X-ray spectroscopy (EDX), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and nanoindenter, respectively. The concentration of molybdenum in the films varies from 1.2 at.% to 10.3 at.%. The increase in molybdenum content promotes the graphitization of DLC films, lowering the sp3 site fraction and increasing the oxygen content, which contributes to the reduction in nanohardness (by 21%) of the DLC films. The decrease in the synthesis temperature from 235 °C to 180 °C enhanced the oxygen amount up to 20.4 at.%. The sp3 site fraction and nanohardness of the Mo-DLC films were enhanced with the reduction in the deposition temperature. The film deposited at a substrate temperature of 235 °C exhibited the lowest friction coefficient (CoF) of 0.03, where its molybdenum concentration was 1.2 at.%. The decline in the synthesis temperature increased the CoF of the Mo-DLC films up to seven times.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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