Band offset between cubic boron nitride and nitrogen-plasma terminated boron-doped diamond (111)
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2025-10-23 |
| Journal | Applied Physics Letters |
| Authors | Ali Ebadi Yekta, Martha R. McCartney, David J. Smith, Norio Tokuda, R. J. Nemanich |
| Institutions | Nanomaterials Research (United States), Arizona State University |
Abstract
Section titled āAbstractāDiamond electronics has attracted attention for high power and high frequency device applications. Cubic boron nitride (c-BN) may be considered as a suitable dielectric layer for electron channel diamond metal-insulator-semiconductor field effect transistors (MISFETs) provided that its valence band edge can be positioned above that of diamond. This study reports experimental measurement of the valence band offset (VBO) between c-BN and nitrogen-plasma terminated boron-doped diamond (111). Nitrogen plasma processing was used to produce C-N bonding at the diamond surface. Electron cyclotron resonance plasma enhanced chemical vapor deposition was then used to deposit epitaxial c-BN films on the N-terminated diamond substrate, as confirmed by cross-sectional high-resolution electron microscopy. X-ray and ultraviolet photoemission spectroscopies indicated that the valence band maximum of c-BN is positioned 0.4 eV above that of diamond resulting in a type II staggered band alignment. This result is consistent with theoretical predictions of the VBO between the two materials in the (111) surface orientation, indicating that c-BN with C-N interface bonding can be used as a dielectric layer for electron channel diamond (111) MISFET devices.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
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