Evaluation of the electrical contact area in contact-mode scanning probe microscopy
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2015-06-02 |
| Journal | Journal of Applied Physics |
| Authors | Umberto Celano, Thomas Hantschel, Guido Giammaria, Ravi Chandra Chintala, Thierry Conard |
| Institutions | IMEC, KU Leuven |
| Citations | 53 |
Abstract
Section titled āAbstractāThe tunneling current through an atomic force microscopy (AFM) tip is used to evaluate the effective electrical contact area, which exists between tip and sample in contact-AFM electrical measurements. A simple procedure for the evaluation of the effective electrical contact area is described using conductive atomic force microscopy (C-AFM) in combination with a thin dielectric. We characterize the electrical contact area for coated metal and doped-diamond tips operated at low force (<200 nN) in contact mode. In both cases, we observe that only a small fraction (<10 nm2) of the physical contact (ā¼100 nm2) is effectively contributing to the transport phenomena. Assuming this reduced area is confined to the central area of the physical contact, these results explain the sub-10 nm electrical resolution observed in C-AFM measurements.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
Section titled āReferencesā- 2007 - Scanning Probe Microscopy Electrical and Electromechanical Phenomena at the Nanoscale