GaN on Diamond with Ultra-Low Thermal Barrier Resistance
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2016-03-31 |
| Authors | Xing Gu, Cathy Lee, Jinqiao Xie, Edward Beam, Michael F. Becker |
Abstract
Section titled āAbstractāAbstract : We investigated the effective thermal boundaryresistance (TBReff) of GaN-on-Diamond interfaces fordiamond growth with a 5nm SiNx, a 5nm AlN interfaciallayer, or without any interfacial layers, respectively. It wasfound that the SiNx interfacial layers resulted in smooth andsharp interfaces, but direct growth of diamond on GaNexhibited very rough interfaces. TBReff is strongly correlatedwith interface quality. With a 5nm SiNx interfacial layer, aTBReff as low as 2.5 m2k/GW was achieved, which is morethan five times better than the previously reported best data,and close to the limit predicted by theoretical models forGaN-diamond interfaces
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal Sourceā- DOI: None