Quantum Dot Low Temperature Measurement and Analysis Thesis
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2017-01-01 |
| Journal | Lund University Publications Student Papers (Lund University) |
| Authors | Vidar Flodgren |
Abstract
Section titled āAbstractāIn this bachelor project, the electron transport within quantum dot transistor devices, whose barriers are electrostatically induced, was measured and analysed. The properties of devices with this particular architecture are not yet fully understood. We successfully synthesised several 150x50x50 nm of these devices, where the potential barrier gates are defined next to the nanowire to form the quantum dot island. These devices were trialled in a low temperature environment by the use of liquid helium and a dip rig in order to study the electron transport through the quantum dot of each device at a temperature of about 4.2 K. These electrostatically induced dots were able to show the Coulomb diamonds produced only within the range of n to n+4 number of electrons. The lever arm αɢ, ĪE between energy levels Eā, the self capacitance CĪ£ and the energy Eį“į“ į“ required to add another electron per diamond of each device were also determined. In general, each device showed the artificial atomic shell structure shown directly by the even-odd electron coupling principle determining the energy required to add additional electrons to the island. Due to time constraints, only two devices out of a total of 11 successfully synthesised were used in measurements. Measurements on the first device were used to explore the quantum dot behaviour induced by the potential barriers. The results from the second device showed that a dot could be induced without the barriers, prompting attempts to prove exactly how the second dot had been induced. It was found that the 350 nm distance between source and drain was sufficient to induce quantum dot behaviour.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal Sourceā- DOI: None