High-Temperature Annealing of Sputter-Deposited AlN on Diamond Substrate
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2019-05-01 |
| Authors | Tatsuya Shirato, Yusuke Hayashi, Kenjiro Uesugi, Kanako Shojiki, Hideto Miyake |
| Institutions | Tsu City College, Mie University |
Abstract
Section titled āAbstractāDiamond is an attractive widegap semiconductor for power devices due to the bandgap of 5.5 eV and high hole conductivity. Quantum sensing by nitrogen-vacancy (NV) centers has also been focused on in recent years. On the other hand, (Al, Ga)N has been extensively studied for deep ultraviolet LEDs and high electron mobility transistors, whereas the poor p-type conductance limits the performance of bipolar devices. Hence, the heterogeneous integration of diamond and (Al, Ga)N is expected to realize efficient carrier injection into widegap bipolar devices.