Optical and Spin Properties of NV Center Ensembles in Diamond Nano-Pillars
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2022-04-29 |
| Journal | Nanomaterials |
| Authors | Kseniia Volkova, Julia Heupel, Sergei Trofimov, Fridtjof Betz, Rémi Colom |
| Institutions | Helmholtz-Zentrum Berlin fĂŒr Materialien und Energie, University of Kassel |
| Citations | 21 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive SummaryâThis research details the successful fabrication and characterization of nitrogen-vacancy (NV) center ensembles integrated into diamond nano-pillars, targeting enhanced quantum sensing capabilities for engineering applications.
- Material and Fabrication: Nano-pillars (up to 1 ”m diameter) were fabricated in nitrogen-rich Type Ib diamond ([100] and [111] orientations) using electron beam lithography (EBL) and inductively coupled plasma reactive ion etching (ICP-RIE).
- NV Center Creation: NV ensembles were created via 6 keV He+ ion bombardment (8 x 1013 ions/cm2 dose) followed by 1000 °C annealing.
- Optical Enhancement: Finite element analysis and measurements confirm significant fluorescence enhancement (up to 8x) into a high-NA objective (0.95), peaking at approximately 200 nm pillar diameter, due to improved photon collection efficiency.
- Ensemble Density: Estimated NV counts per pillar are high: 4300 ± 300 NVs ([100]) and 520 ± 120 NVs ([111]). The lower count in [111] is attributed to reduced vacancy creation efficiency during ion bombardment.
- Spin Coherence: Measured electron spin coherence times (T2) were 420 ns ([100]) and 560 ns ([111]), typical for NV centers in high-nitrogen concentration diamond.
- Sensing Performance: Calculated maximum achievable magnetic field sensitivity for the [100] pillars is 11.6 nT/âHz, suitable for wide-field and scanning probe applications measuring relatively strong fields.
- Lifetime Characteristics: Fluorescence decay is bi-exponential (Ï1 ~2 ns, Ï2 ~8 ns), significantly shorter than single NV centers in bulk diamond, likely due to coupling and interaction with bombardment-induced defects (P1 centers).
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Diamond Type | Ib (HPHT) | N/A | Nitrogen-rich starting material |
| P1 Center Concentration | 65 to 68 | ppm | Substitutional nitrogen concentration |
| Crystal Orientation Tested | [100] and [111] | N/A | Substrate orientations |
| Ion Implantation Energy | 6 | keV | He+ ion bombardment for vacancy creation |
| Ion Implantation Dose | 8 x 1013 | ions/cm2 | Total dose applied |
| Annealing Temperature | 1000 | °C | Vacuum annealing for NV formation |
| Annealing Pressure | <10-7 | mbar | Ultra-high vacuum |
| Estimated NV Count ([100]) | 4300 ± 300 | NVs/pillar | Average for ensemble pillars |
| Estimated NV Count ([111]) | 520 ± 120 | NVs/pillar | Average for ensemble pillars |
| Pillar Height ([100] sample) | 2.2 ± 0.2 | ”m | Longer etch time (11 min) |
| Pillar Height ([111] sample) | 1.4 ± 0.2 | ”m | Shorter etch time (8 min) |
| Etching Rate ([100]) | 180-220 | nm/min | Determined from SEM measurements |
| Etching Rate ([111]) | 150-200 | nm/min | Determined from SEM measurements |
| Fluorescence Enhancement | Up to 8 | x | Compared to flat interface (NA=0.95) |
| Optimal Pillar Diameter | ~200 | nm | For maximum fluorescence enhancement |
| ODMR Contrast (Maximum) | ~5 | % | Optically detected magnetic resonance |
| Coherence Time T2 ([100]) | 420 ± 40 | ns | Electron spin coherence time |
| Coherence Time T2 ([111]) | 560 ± 50 | ns | Electron spin coherence time |
| Relaxation Time T1 ([100]) | 162 ± 11 | ”s | Electron spin relaxation time |
| Relaxation Time T1 ([111]) | 174 ± 24 | ”s | Electron spin relaxation time |
| Calculated Sensitivity ([100]) | 11.6 | nT/âHz | Maximum achievable magnetic field sensitivity |
| Calculated Sensitivity ([111]) | 26.8 | nT/âHz | Maximum achievable magnetic field sensitivity |
Key Methodologies
Section titled âKey MethodologiesâThe fabrication process combines ion implantation, annealing, and nanofabrication techniques to create structured NV ensembles:
- Material Preparation: Type Ib diamond substrates ([100] and [111] orientation) were cleaned using solvents (acetone, IPA) and piranha acid (3:1 H2SO4:H2O2).
- Vacancy Creation: Samples were bombarded with 6 keV He+ ions at a dose of 8 x 1013 ions/cm2 to create vacancies near the surface (depth profile simulated by SRIM).
- NV Formation: Samples were annealed at 1000 °C for two hours in ultra-high vacuum (<10-7 mbar) to mobilize vacancies, allowing them to combine with substitutional nitrogen (P1 centers) to form NV centers.
- EBL Mask Definition:
- A 7 nm Au conductive layer was deposited.
- Positive EBL resist (AR-P 617.06) was spin-coated.
- Pillar arrays (nominal 100 nm and 200 nm circles) were defined using EBL, testing various electron doses (42 ”C/cm2 to 12.6 mC/cm2) to control proximity effects and final diameter.
- Resist was developed using MIBK:IPA (1:3).
- Hard Mask Deposition and Lift-Off:
- A 200 nm Au hard mask (with 5 nm Ti adhesion layer) was deposited.
- Lift-off was performed using DMSO (80 °C overnight) or 96% H2SO4 (5 min) to remove the resist and leave only the circular Au/Ti mask features on the diamond surface.
- Diamond Etching (ICP-RIE):
- An Oxford Instruments PlasmaLab 100 system was used for dry etching.
- Parameters: 1000 W ICP power, 200 W RF power, 10 sccm O2 flow, 30 °C substrate temperature, and 5 mTorr (0.7 Pa) chamber pressure.
- Etch Time: 11 min for [100] samples; 8 min for [111] samples.
- Mask Removal: The Au mask was removed with potassium iodide solution (KI:I2 4:1 mixture), and the Ti adhesion layer was removed with 10% HF solution.
- Characterization: Pillars were analyzed using SEM (morphology/size), confocal microscopy (fluorescence mapping), time-correlated photon counting (lifetime), and pulsed/CW ODMR (spin properties T1, T2).
Commercial Applications
Section titled âCommercial ApplicationsâThe development of structured NV ensemble sensors in low-cost, high-nitrogen Type Ib diamond enables several applications, particularly where high photon count rates and moderate sensitivity are required.
- Quantum Sensing and Metrology:
- Scanning Probe Magnetometry: The nano-pillars can serve as robust tips for scanning probe systems, allowing nanoscale imaging of magnetic fields (e.g., investigating magnetic layers or hard drives).
- Wide-Field Imaging: NV ensembles provide high photon flux, enabling faster data acquisition and simpler experimental setups (like wide-field microscopes) for magnetic field mapping over larger areas.
- Low-Cost Quantum Hardware:
- The use of readily available and cheaper HPHT Type Ib diamond (used widely in industrial grinding/cutting) allows for the low-cost production of structured quantum sensors, bypassing the need for expensive, ultra-pure CVD diamond.
- Solid-State Quantum Architectures:
- The pillars act as photonic structures, improving the collection efficiency of emitted photons, which is crucial for integrating NV centers into scalable solid-state quantum technology architectures.
View Original Abstract
Nitrogen-vacancy (NV) color centers in diamond are excellent quantum sensors possessing high sensitivity and nano-scale spatial resolution. Their integration in photonic structures is often desired, since it leads to an increased photon emission and also allows the realization of solid-state quantum technology architectures. Here, we report the fabrication of diamond nano-pillars with diameters up to 1000 nm by electron beam lithography and inductively coupled plasma reactive ion etching in nitrogen-rich diamonds (type Ib) with [100] and [111] crystal orientations. The NV centers were created by keV-He ion bombardment and subsequent annealing, and we estimate an average number of NVs per pillar to be 4300 ± 300 and 520 ± 120 for the [100] and [111] samples, respectively. Lifetime measurements of the NVsâ excited state showed two time constants with average values of Ï1 â 2 ns and Ï2 â 8 ns, which are shorter as compared to a single color center in a bulk crystal (Ï â 10 ns). This is probably due to a coupling between the NVs as well as due to interaction with bombardment-induced defects and substitutional nitrogen (P1 centers). Optically detected magnetic resonance measurements revealed a contrast of about 5% and average coherence and relaxation times of T2 [100] = 420 ± 40 ns, T2 [111] = 560 ± 50 ns, and T1 [100] = 162 ± 11 ÎŒs, T1 [111] = 174 ± 24 ÎŒs. These pillars could find an application for scanning probe magnetic field imaging.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
Section titled âReferencesâ- 2008 - Nanoscale imaging magnetometry with diamond spins under ambient conditions [Crossref]
- 2008 - Nanoscale magnetic sensing with an individual electronic spin in diamond [Crossref]
- 2011 - Electric-field sensing using single diamond spins [Crossref]
- 2013 - Nanometre-Scale Thermometry in a Living Cell [Crossref]
- 2013 - High-Precision Nanoscale Temperature Sensing Using Single Defects in Diamond [Crossref]
- 2014 - Electronic properties and metrology applications of the diamond NVâ center under pressure [Crossref]
- 2010 - Monolithic Diamond Optics for Single Photon Detection [Crossref]
- 2012 - Coupling of Nitrogen-Vacancy Centers to Photonic Crystal Cavities in Monocrystalline Diamond [Crossref]
- 2010 - A Diamond Nanowire Single-Photon Source [Crossref]
- 2015 - Nanoengineered Diamond Waveguide as a Robust Bright Platform for Nanomagnetometry Using Shallow Nitrogen Vacancy Centers [Crossref]