Electrical characteristics of normally off hydrogen-terminated diamond field effect transistors with lanthanum oxide gate dielectric
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2022-10-17 |
| Journal | Applied Physics Letters |
| Authors | Jianing Su, Genqiang Chen, Wei Wang, Han Shi, Shi He |
| Institutions | Xiāan Jiaotong University |
| Citations | 12 |
Abstract
Section titled āAbstractāA normally off hydrogen-terminated diamond (H-diamond) metal-oxide-semiconductor field effect transistor (MOSFET) is realized by using lanthanum oxide (La2O3) gate dielectric. The threshold voltage is demonstrated to be ā0.797 V, indicating that the La2O3-gated H-diamond MOSFET has normally off characteristics. The normally off mode could be greatly ascribed to the low work function of La2O3. Based on the capacitance-voltage (C-V) curves, the dielectric constant of La2O3 is calculated to be as high as 25.6. Moreover, the small hysteresis voltage extracted from the C-V curves exhibits low trapped charge density in the La2O3 layer. The maximum drain-source current, maximum transconductance, subthreshold swing, effective mobility, current on/off ratio, and sheet hole density of La2O3-gated MOSFET with a gate length of 2 Ī¼m are calculated to be ā13.55 mA/mm, 4.37 mS/mm, 161 mV/dec, 202.2 cm2/VĀ·s, 108, and 6.53 Ć 1012 cmā2, respectively. This work will significantly promote the development of normally off H-diamond MOSFET devices.