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Polycrystalline Diamond MOSFET With MoO3 Gate Dielectric and Passivation Layer

MetadataDetails
Publication Date2017-07-17
JournalIEEE Electron Device Letters
AuthorsZeyang Ren, Jinfeng Zhang, Jincheng Zhang, Chunfu Zhang, Dazheng Chen
InstitutionsXidian University
Citations19

We report the hydrogen terminated polycrystalline diamond MOSFET with a 10-nm MoO <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;3&lt;/sub> gate dielectric and a 50-nm MoO <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;3&lt;/sub> passivation layer. The device with a gate length of 2 μm shows the saturation drain current (IDsat) of 100 mA/mm, the transconductance of 35 mS/mm, and the ON-resistance of 76.54 Q·mm at V <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;GS&lt;/sub> = -2.5 V. The stability of the repeated I <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;DS&lt;/sub> -V <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;GS&lt;/sub> measurements was demonstrated by a mere I <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;Dsat&lt;/sub> decrease of 3.3% between the first and third sweepings. In addition, the devices worked well at 200 °C delivering even larger I <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;Dsat&lt;/sub> than that at room temperature. The possible mechanisms for I <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;DS&lt;/sub> -V <sub xmlns:mml=“http://www.w3.org/1998/Math/MathML” xmlns:xlink=“http://www.w3.org/1999/xlink”&gt;GS&lt;/sub> changes in the successive measurements and induced by the change of the ambient temperature are suggested.

  1. 2000 - MoO3: Optical properties dielectric constants