Development of an Array of Compound Refractive Lenses for Sub-Pixel Resolution, Large Field of View, and Time-Saving in Scanning Hard X-ray Microscopy
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2020-06-16 |
| Journal | Applied Sciences |
| Authors | Talgat Mamyrbayev, Alexander Opolka, Alexey Ershov, Josephine Gutekunst, Pascal Meyer |
| Institutions | Tohoku University, Karlsruhe Institute of Technology |
| Citations | 5 |
| Analysis | Full AI Review Included |
Executive Summary
Section titled âExecutive SummaryâThis research details the development and characterization of a high-performance, two-dimensional (2D) array of Compound Refractive Lenses (CRLs) designed for hard X-ray microscopy applications requiring high spatial resolution and a large field of view (FoV).
- Core Achievement: Fabrication of a 2D 34x34 multi-lens array (1156 point foci) using deep X-ray lithography (LIGA process) in radiation-stable SU-8 polymer.
- Performance Metrics: Tested at 34 keV, the array achieved an average Spectral Intensity Enhancement (SIE) of 16 and an average transmission of 66%.
- Resolution: Generated small point foci (FWHM) averaging 2.10 ”m (Vertical) and 3.55 ”m (Horizontal), enabling sub-pixel resolution scanning transmission X-ray microscopy (STXM).
- Field of View (FoV): The array provides a large FoV of 3.5 mm2, significantly larger than previous 2D arrays, suitable for studying relatively large samples.
- Integration: The array is designed to match the pixel pitch (55 ”m x 55 ”m) of standard low-resolution photon-counting detectors (e.g., Medipix Merlin 3.0).
- Future Scalability: The methodology is adaptable for fabricating Nickel CRL arrays for use at higher photon energies (above 80 keV, up to 100 keV), addressing the demand for high-energy focusing optics at bending magnet sources.
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Lens Array Configuration | 34 x 34 | elements | Total 1156 point foci |
| Field of View (FoV) | 3.5 | mm2 | Total area covered by the array |
| Target Photon Energy (Test) | 34 | keV | Tested energy at Diamond Light Source B16 |
| Designed Focal Length (fv,h) | 359 | mm | Calculated design value |
| Measured Focal Length (fexp,v,h) | 362 ± 4 | mm | Experimental result |
| Vertical Focal Spot Size (FWHM) | 2.10 ± 0.81 | ”m | Measured average spot size |
| Horizontal Focal Spot Size (FWHM) | 3.55 ± 0.62 | ”m | Measured average spot size |
| Spectral Intensity Enhancement (SIE) | 16 | dimensionless | Average focusing gain |
| Average Transmission (Tavg) | 66 | % | Measured via SIE |
| Individual CRL Aperture (Aph) | 55 x 55 | ”m | Matches detector pixel pitch |
| Detector Pixel Size (Medipix) | 55 x 55 | ”m | Low resolution detector used for imaging |
| Refractive Surface Roughness | 20 | nm | Achieved via deep X-ray lithography |
| Total Array Length (LCRL) | 22.5 | mm | Physical length along the optical axis |
| Radius of Curvature (Rv,h) | 15.9 | ”m | Parabolic surface parameter |
| Refractive Index Decrement (ÎŽ) | 2.43 x 10-7 | dimensionless | At 34 keV |
Key Methodologies
Section titled âKey MethodologiesâThe 2D multi-lens array was fabricated using deep X-ray lithography (a variant of the LIGA process) followed by mechanical assembly, and characterized using monochromatic synchrotron radiation.
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Fabrication (Deep X-ray Lithography):
- Resist Material: SU-8 epoxy-based negative resist, applied in a 2 mm high layer onto a 525 ”m silicon substrate.
- Mask: A working mask consisting of 20 ”m thick gold absorbers on a 2.5 ”m titanium membrane was used.
- Exposure: X-ray exposure was performed at a dose of 19,845 mA*min/cm2.
- Baking and Development: Post-exposure bake was performed at 66 °C for 20 hours. Unexposed resist was removed using propylene glycol methyl ether acetate (PGMEA) for 2 hours, followed by rinsing in isopropanol.
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Assembly (2D Array Formation):
- The lithography process initially yielded 1D line focus lenses.
- To create the 2D point focus array (SHS), the substrate was cut, and one set of 1D line focus lenses was rotated 90° around the optical axis and mounted in an interdigitated configuration.
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X-ray Characterization:
- Beamline: Diamond Light Source B16 bending magnet test beamline.
- Energy: Monochromatic 34 keV X-rays (Energy resolution ÎE/E = 10-4).
- Focal Spot Measurement: Point foci were measured using a high-resolution indirect detector system (5 ”m LuAG:Eu scintillator coupled with a 10x objective and CCD camera, resulting in 0.9 ”m effective pixel size).
- Data Analysis: Focal length and focal spot size (FWHM) were determined by fitting the foci using the 2D Gaussian method.
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Sub-Pixel Resolution Imaging (STXM):
- Detector: Medipix Merlin 3.0 photon-counting detector (55 ”m pixels).
- Scanning: The sample (a gold Siemens star test pattern) was raster-scanned using a piezo stage with 1 ”m steps (sub-pixel shift) within the 55 ”m pixel size.
- Reconstruction: Sub-pixel resolution images were reconstructed by combining the low-resolution images acquired at each sub-pixel step.
Commercial Applications
Section titled âCommercial ApplicationsâThis technology provides a critical advancement in hard X-ray optics, enabling faster, higher-resolution imaging over larger areas, which is essential for non-destructive evaluation (NDE) and advanced materials research.
- Non-Destructive Testing (NDT): High-energy X-rays (15 keV to 100 keV) allow for the study of optically thick objects, such as characterizing crack distributions and internal defects in metallic plates, composite materials, and industrial components.
- Synchrotron Beamline Optics: The 2D multi-lens array serves as an attractive optical element for hard X-ray microscopy applications at synchrotron facilities, providing both large FoV and high spatial resolution simultaneously.
- High-Speed Imaging: The multi-foci array enables rapid scanning transmission X-ray microscopy (STXM), significantly reducing the time required for a complete raster scan compared to conventional single-lens STXM, facilitating the study of dynamic processes.
- Advanced Materials Research: Used for high-resolution structural analysis and characterization of complex materials, including polymers, ceramics, and high-density alloys, especially when high penetration depth is required.
- Detector Technology Integration: The design is optimized for use with standard, relatively low-resolution pixel detectors (55 ”m pitch), simplifying the overall system complexity and cost compared to systems requiring ultra-high-resolution detectors.
View Original Abstract
A two-dimensional array of compound refractive lenses (2D array of CRLs) designed for hard X-ray imaging with a 3.5 mm2 large field of view is presented. The array of CRLs consists of 2D polymer biconcave parabolic 34 à 34 multi-lenses fabricated via deep X-ray lithography. The developed refractive multi-lens array was applied for sub-pixel resolution scanning transmission X-ray microscopy; a raster scan with only 55 à 55 steps provides a 3.5 megapixel image. The optical element was experimentally characterized at the Diamond Light Source at 34 keV. An array of point foci with a 55 ”m period and an average size of ca. 2.1 ”m à 3.6 ”m was achieved. In comparison with the conventional scanning transmission microscopy using one CRL, sub-pixel resolution scanning transmission hard X-ray microscopy enables a large field of view and short scanning time while keeping the high spatial resolution.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
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