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6CCVD Research

Growth and Characterization of Polycrystalline CVD Diamond Films Obtained by MWPACVD at High Power 2,45GHz Microwave Discharge

At a Glance

Section titled ā€œAt a Glanceā€
MetadataDetails
Publication Date2022-01-01
JournalMaterials Research
AuthorsJosĆ© Vieira da Silva Neto, Javier Sierra GĆ³mez, E.J. Corat, V.J. Trava-Airoldi
InstitutionsNational Institute for Space Research

Abstract

Section titled ā€œAbstractā€

Among all the allotropic forms of carbon, diamond has attracted a broad scientific and technological interest for its extreme and unique properties rarely matched by other materials in nature. In a rapid rise from a technological point of view, much has been achieved in the study of obtaining this material through CVD technique. Studies of CVD diamond growth parameters of monocrystalline structure, underway in the team, are very expensive and time-consuming requiring in-depth studies of CVD diamond growth parameters of polycrystalline structure. So, this work presents an analysis focused on obtaining CVD diamond films with polycrystalline structure through the 2.45 GHz microwave plasma activation method (MWPACVD) in high power regime using a modified substrate holder to find a set of parameters appropriated for getting uniform quality and growth rate of thick films. The films were characterized using Raman scattering spectroscopy and scanning electron microscopy. The results point to optimized conditions for depositing films with growth rates of up to 20 Āµm/h with low levels of intrinsic stress, good structural quality and uniform microcrystalline morphology along the deposition surface.

Tech Support

Section titled ā€œTech Supportā€

Original Source

Section titled ā€œOriginal Sourceā€

References

Section titled ā€œReferencesā€
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