Fabrication of none-opposite-deposited micro-structure on diamond with the SiO2/Cr bilayer mask
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2022-02-15 |
| Journal | Seventh Asia Pacific Conference on Optics Manufacture and 2021 International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2021) |
| Authors | Zhiqi Yang, Xing Liu, TsuāChien Weng |
| Institutions | ShanghaiTech University, Shanghai Advanced Research Institute |
Abstract
Section titled āAbstractāBenefitting from the ultra-broad transparency window, high refractive index and exceptional thermal conductivity, diamond has attracted numerous spotlights on the optical applications and the academic researches. However, the practical deployments of high-quality diamond element were obstructed by the immature manufacture techniques. Here we designed a new mask system for diamond etching that utilizes SiO<sub>2</sub> as the main hard mask layer and Cr as the adhesive layer. The cross-section morphology revels three distinct characteristics including an upper slope, a middle vertical sidewall and a trench at the bottom because of the retreat of thick SiO<sub>2</sub> mask during the etching process. The completely different etching profile from the previous metal masks has the potential to realize higher aspect ratio etching than traditional metal masks for diamond elements.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
Section titled āReferencesā- 2018 - Down-scaling grating couplers and waveguides in single-crystal diamond for VIS-UV operation